September 10 - 12, 2013    Costa Mesa CA , USA
The 33rd Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the forum to present the newest findings, to discuss the most exciting trends, and to ponder reliable solutions in this rapidly developing industry and their effects on the semiconductor lithography.

Come to the mask-making industry's premier event, 10-11 September 2013, and meet with the key suppliers of components, software, and manufacturing equipment in the mask industry.

• Keynote Speaker
John Y. Chen

• list of exhibitors
Carl Zeiss SMS GmbH
Gudeng
Ibss Group, Inc.
Inko Industrial Corp.
Micro Lithography, Inc.
Pozzetta
RAVE LLC
and many more.

Venue

Location: Monterey Conference Center
The Monterey Conference Center inspires innovation and celebration. Set on the spectacular central California coast, the Monterey Conference Center offers breathtaking and intimate settings for any..
Contact One Portola Plaza Monterey, CA 93940 Costa Mesa , USA
831.646.3770

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