April 13 - 15, 2010    Yokohama , Japan
Photomask Japan 2010 is the 17th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

Venue

Location: Pacifico Yokohama
PACIFICO YOKOHAMA, a world-class convention center, connects people all over the world Since the global human issues we are focusing on today include environment and peace, the role of..
Contact 1-1-1, Minato Mirai, Nishi-ku, , Japan Yokohama , Japan
+81-45-221-2121

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