September 29 - October 1, 2015    Costa Mesa CA , USA

The SPIE Photomask Technology Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Co-located with SPIE Scanning Microscopy 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. 

Mask Making 
+ Mask data preparation
+ Substrates and materials
+ Patterning tools and processes
+ Resist and resist processing
+ Etch techniques 
+ Metrology 
+ Inspection
+ Repair
+ Cleaning, contamination, and haze
+ Simulation of mask making
9-inch Glass
+ Impact of 450mm wafers on reticle and infrastructure
+ Tool developments to support larger blanks 
+ Material developments 
Mask Business
+ EUV mask making
+ EUV mask inspection and repair 
+ EUV mask infrastructure 
+ EUV mask application 
+ Nanoimprint mask making
+ Nanoimprint mask application 
+ Pixelated masks 
+ Alternative mask technologies 
+ Grey-scale masks
+ Direct-write, ML²

Venue

Location: Monterey Conference Center
The Monterey Conference Center inspires innovation and celebration. Set on the spectacular central California coast, the Monterey Conference Center offers breathtaking and intimate settings for any..
Contact One Portola Plaza Monterey, CA 93940 Costa Mesa , USA
831.646.3770

Organizer

SPIE - the international society for optics and photonics
PO Box 10 Bellingham WA 98227-0010 USA
+1 360 676 3290 or +1 888 504 8171

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